

2011 年度 R&D 100 大奖获得者。 采用新型 Thermo Scientific™ Evolution 201 和 220 紫外-可见光系统进行分析,扩展了实验室的应用范围,并提高了工作效率。 借助新一代 INSIGHT 软件实现机载控制和计算机控制,您的仪器始终将保持最新状态,并能随时应对下一个挑战。 我们的自定义用户环境 (CUE) 软件允许您完全自定义逻辑测量步骤和输出环境,从而将您的常规测量提升到新的水平。
无论常规分析还是研究分析,该系列仪器真正的创新之处在于增强了实用性和性能 - 却不会增加复杂性。 简单的软件、先进的仪器以及广泛的附件选择让 Evolution 201 和 220 系统能按您希望的方式进行实验并获得您需要的结果。
INSIGHT 软件——化繁为简
优化的工程学设计可提供最佳性能
指尖轻点,轻松完成
满足所有采样需求的附件
保障系统性能
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基线平坦度 | ±0.0010A, 200-800nm, 1.0nm SBW, smoothing |
Data Interval | 10, 5, 2, 1.0, 0.5, 0.2, 0.1nm |
描述 | Cutting-edge instrumentation, intuitive and powerful software, and a wide range of accessories consistently deliver high quality results and improved productivity |
检测器类型 | Dual Silicon Photodiodes |
Dimensions (L x W x H) | 62.2 x 48.6 x 27.9cm |
显示 | None |
漂移 | <0.0005A/hr, 500nm, 1.0nm SBW, 1 hr warm-up |
Electrical Requirements | 100-240V 50-60Hz, selected automatically,150W maximum |
物品描述 | Evolution 220 PC |
键盘 | Sealed membrane |
灯 | Xenon Flash Lamp, 3 year warranty (7 years typical lifetime) |
噪声 |
0A: <0.00015A; 1A: <0.00025A; 2A: <0.00080A; 260nm, 1nm SBW, RMS |
操作系统 | Microsoft Windows™ XP embedded. INSIGHT 2 Software is also compatible with Windows 7 and Windows 8.1 Professional Editions. |
光学设计 | Double Beam with sample and reference cuvette positions; Application Focused Beam Geometry; Czerny-Turner Monochromator |
Pharmacopoeia Compliance Testing |
(Guaranteed Performance Specifications) Resolution (toluene in Hexane): ≥1.8A Photometric Accuracy (60 mg/L K2Cr2O7): ±0.010A Stray Light: ≤1%T at 198nm: KCI; < or = to 0.05 %T at 220nm: Nal, Kl Wavelength Accuracy: ±0.5nm 541.9, 546.1nm Hg emission lines, ±0.8nm full range Wavelength Repeatability: ≤0.05nm, repetitive scanning of 546.1nm Hg emission line |
Photometric Accuracy Instrument |
1A: ±0.006A 2A: ±0.010A Measured at 440nm using calibrated neutral density filters traceable to NIST |
Photometric Display | -0.3 to 4.0A |
Photometric Range | >3.5A |
Photometric Repeatability | ±0.0002A |
Scan Ordinate Modes | Absorbance, % Transmittance, % Reflectance, Kubelka-Munk, log (1/R), log (Abs), Abs*Factor, Intensity |
扫描速度. | <1-6000nm/min, variable |
光谱带宽 | Variable: 1.0nm; 2.0nm; AFBG Microcell optimized; AFBG Fiber optic optimized; AFBG Materials optimized |
类型 | Evolution 220 Computer Control Spectrophotometer |
波长精度 | ±0.5nm (541.9, 546.1nm mercury lines), ±0.8nm (full range 190 to 1100nm) |
波长范围 | 190 to 1100nm |
波长重复性 | ≤0.05nm (546.11nm mercury line, SD of 10 measurements) |
重量(公制) | 14.4kg |